Archive for April, 2004

Coulomb Blockade in a Silicon/Silicon-Germanium Two-Dimensional Electron Gas Quantum Dot

April 20th, 2004  |  by  |  published in All, Papers

Appl. Phys. Lett. v84, p4047 (2004)

We report the fabrication and electrical characterization of a single electron transistor in a modulation doped silicon/silicon-germanium heterostructure. The quantum dot is fabricated by electron beam lithography and subsequent reactive ion etching. The dot potential and electron density are modified by laterally defined side gates in the plane of the dot. Low temperature measurements show Coulomb blockade with a single electron charging energy of 3.2 meV.

Tahan Research

Recent Comments

    Recent Comments


      Recent Posts